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Wafer Processing & Tooling: Enabled with PECM

For wafer processing equipment and tooling subsystems, Voxel supports components that demand tight geometric control, repeatable precision features, and non-contact material removal to avoid residual stress or damage. PECM enables the ability to machine and finish complex internal and external features without introducing burrs or tool-induced defects. Examples include arrays of slots, holes, and thin sections. Our approach is particularly effective for custom or production tooling where consistent replication across parts is critical, and where traditional machining or EDM can introduce variability that degrades process stability over time.

Semiconductor

Wafer processing equipment operates within extremely tightly controlled mechanical, thermal, and electromagnetic environments. Subtle geometric variation in tooling subsystems can carry significant consequences, and in high-volume production, even small dimensional drift across tooling batches can accumulate into measurable process instability.
 

Conventional machining methods remove material through mechanical contact, introducing localized stress, microburring, minor deformation and more. For geometries common in wafer manufacturing such as small micro-arrays of narrow slots, these effects may require secondary deburring or polishing steps that introduce additional variability.
 

Electrical discharge machining (EDM), while capable of producing complex shapes, inherently relies on localized thermal erosion, creating recast layers or altered surface microstructures that must be mitigated depending on the application and material. In tooling that interfaces directly with wafers or plasma environments, surface condition and edge definition are not cosmetic considerations; they directly influence field uniformity, gas flow behavior, and long-term dimensional stability.
 

PECM removes material through controlled electrochemical dissolution rather than thermal melting or mechanical shear. Because the cathode does not contact the workpiece, the process minimizes mechanically induced stresses and reduces the likelihood of burr formation in thin or high-aspect-ratio features. This is particularly advantageous in replicated feature arrays, where edge consistency and surface uniformity must be maintained across large surface areas.
 

Feature-to-feature consistency within a single part is only half the challenge: maintaining that same geometry across dozens or hundreds of tooling components over time is what ultimately determines process stability at the tool level. Voxel’s control of cathode geometry, pulse parameters, and electrolyte conditions allows replication of complex features with high repeatability, supporting both prototype validation and scaled manufacturing.

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