
Data Center Cooling Infrastructure: Enabled with PECM
Voxel’s PECM capabilities extend to semiconductor thermal infrastructure, including components that rely on internal channels, microfeatures, or thin-wall geometries to manage heat efficiently. We support internal surface finishing and feature generation in thermally conductive materials, enabling improved flow uniformity and reduced risk of crack initiation in high-stress regions. By leveraging custom cathodes and controlled pulsed electrochemistry, we deliver repeatable results across production volumes, supporting thermal management components where reliability, consistency, and long-term performance are essential.

Data center infrastructure is increasingly constrained by thermal limits rather than compute architecture alone. As processor power densities rise and rack-level loads increase, cooling systems must remove more heat from smaller footprints without introducing flow instability, pressure imbalance, or long-term material degradation.
Advanced cold plates, manifold plates, and liquid-cooled heat exchangers depend on tightly controlled internal channel geometry. Small variations in channel width, wall thickness, or entrance features can alter flow distribution and local heat transfer coefficients. In high-power applications, uneven flow may create localized hotspots that reduce component lifespan or limit achievable performance envelopes.
Traditional machining approaches can struggle with dense internal geometries, especially in copper and high-conductivity alloys. Thin walls are susceptible to deformation during cutting, and secondary finishing operations may introduce geometric drift. In complex internal passages, burrs or surface irregularities can disrupt laminar flow regimes and increase turbulence or pressure drop in unintended regions.
PECM enables the formation and finishing of intricate internal channels and microfeature arrays without mechanical tool contact. Because material removal occurs through controlled electrochemical dissolution, thin sections can be maintained with reduced risk of mechanical distortion. The process supports smooth internal flow paths and controlled edge transitions, both of which influence hydraulic performance and long-term reliability.
For liquid-cooled semiconductor systems, reliability extends beyond initial performance. Thermal cycling, pressure fluctuations, and vibration can amplify microscopic stress concentrations over time. Surface condition and feature consistency therefore influence not just heat transfer, but fatigue behavior and crack initiation risk in high-stress regions. By avoiding thermally induced recast layers and minimizing mechanically introduced stress, PECM provides a stable manufacturing route for components expected to operate continuously over extended service intervals.

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300μm microholes in copper

Demonstration of internal "s-shaped" non-line-of-sight finishing capabilities via PECM

PECM finishing on conal-shaped sample parts to demonstrate postprocessing capability

300μm microholes in copper
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